Polishing characteristics of micron particles aggregated by nanosilica
Colloidal silica slurry has been widely used in mirror finishing of various microelectronic materials, including Si wafer.However, in the last decade, there has been a tendency to replace the polishing slurry with fixed-abrasive pads because of environmental issues related to HALTER/BRIDLE BAG WITH 3 HOOK RACK the use of slurry and poor finishing s